| 摘要 |
<p>PURPOSE:To improve the mechanical durability of a light shielding film, and to reduce the refractive index of the titled blank by forming the light shielding film composed of a chromium layer on a glass substrate by a vacuum depositing method, etc., followed by subjecting the shading film to plasma treatment. CONSTITUTION:The light shielding film composed of the chromium layer or a chromium compd. is formed on the glass substrate by the vacuum depositing or a sputtering method. Next, the substrate 12 mounted with a metallic chrom layer thereon is disposed on a table 22 of a plasma surface treating apparatus 20. And, said plate 12 is subjected to the plasma treatment by a high frequency discharge generated between an upper electrode 24 and a lower electrode 23 in an atmosphere of oxygen and nitrogen gas, etc., to form an oxide film or a nitride film. Subsequently, the resist film is formed to obtain the titled blank. Accordingly, as the light shielding film is treated with the plasma, the mechanical durability of the light shielding film is improved, and the refractive index of the titled blank is reduced, and the etching aptitude of said blank can be improved.</p> |
