发明名称 GRADATION MASK
摘要 <p>PURPOSE:To provide a gradation mask with stepwise change of the transmittance which can be manufactured in a correct, efficient and inexpensive manner, and where the transmittance is changed stepwise. CONSTITUTION:The transmittance is changed stepwise in the space over three steps which substantially includes 0% and 100% in a gradation mask, and the region (a) where at least the transmittance is substantially 0% has the specified transmittance other than 0% and 10 0%, and a semi-transparent film 12 whose phase difference is one half or an odd multiple of one half of the wavelength to be substantially used is provided in a finely repetitive pattern. The region (b) of the intermediate is provided with the semi-transparent film 12 over the whole area of the transparent substrate 11.</p>
申请公布号 JPH0749411(A) 申请公布日期 1995.02.21
申请号 JP19930195963 申请日期 1993.08.06
申请人 DAINIPPON PRINTING CO LTD 发明人 NAKAMURA HIROYUKI;HAYASHI NAOYA
分类号 G02B5/20;G03F1/32;G03F1/68;G03F1/76;(IPC1-7):G02B5/20 主分类号 G02B5/20
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