DEVICE AND METHOD FOR MEASURING CONTAMINATED PARTICLE GENERATED IN MANUFACTURING PROCESS OF SEMICONDUCTOR DEVICE AND ANALYSIS METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To perform the management of time and process by measuring contaminated particles generated from a gas delivery system(GDS) and the utility section thereof for each process thereby quantizing the contaminated particles generated from the GDS. SOLUTION: The internal structure comprises a particle counter 24 in a particle shading system for measuring contaminated particles, a computer system 26, a gas pressure reducer 22, and an impactor 18 for sampling the contaminated particles. In order to fix the counter 24 to the system and to produce a desired gas flow while setting a zero count for the counter 24, first and second air valves 14a, 14b are closed and a third air valves 14c is opened. A regulator 10 regulates the gas flow such that the counter 24 points zero. A test part 16 is then mounted and the valves 14a, 14b are opened while the valves 14c is closed and the particles are measured. At the same time, particles are sampled by the impactor 18. The impactor 18 analyzes the structure and components of particle and compares the results with those of particle on a wafer.