POSITIVE TYPE RESIST COMPOSITION FOR ELECTRON BEAM OR X- RAY

摘要

PROBLEM TO BE SOLVED: To provide a positive type resist composition for electron beams or X-rays having high sensitivity and high resolution and excellent in stability of PED. SOLUTION: The positive type photoresist composition contains (a) a compound which generates an acid when irradiated with electron beams or X-rays, (b) a resin having the residue of a compound having a lower ionization potential than p-ethylphenol in a group released by the action of the acid and having a velocity of dissolution in an alkali developing solution increased by the action of the acid and (c) a solvent.