SYSTEM FOR CLEANING SEMICONDUCTOR WAFER AND METHOD FOR SUPPLYING CLEANING SOLUTION

摘要

PURPOSE: A semiconductor wafer cleaning system and a method for supplying a cleaning solution are provided to improve work efficiency and compatibility by forming the characteristic and condition of a cleaning solution in a short time, to reduce the working time, to lengthen the life span of the cleaning solution, and to reduce the manpower. CONSTITUTION: The system comprises a cleaning vessel(32) for receiving blended chemicals supplied from a cleaning solution supply unit(30), a discharge unit(36) connected with the cleaning solution supply unit and the cleaning vessel for discharging the chemicals of respective states by a discharge control signal, and a controller for selectively applying a supply control signal and a discharge control signal to the cleaning solution supply unit and the discharge unit. The cleaning solution supply unit includes plural chemical tanks(38) for independently receiving plural chemicals, pipes(S') for making more than one chemical flow paths, and valves(V) installed on respective pipes for controlling the flow of the chemicals with response to the supply control signal.