| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a vaporizer enabling the low-temperature vaporization of a liquid raw material to be supplied for film deposition in a CVD apparatus. <P>SOLUTION: A vaporizer (10) is provided with a vaporizing chamber (60) heated with heaters (66), (76) and (81), a primary filter (80) set at the bottom of the chamber (60) and heated with the heater (81), a liquid raw material feeder (24) for dropping a liquid raw material (LM) controlled in flow rate from the top of the chamber (60) toward the filter (80), a carrier gas introduction passageway (78) for introducing a carrier gas (CG) to the underside of the primary filter (80), and a raw material discharge passageway (62) for discharging a mixed gas (VM+CG) of the carrier gas (CG) and a vaporized liquid raw material (VM) from the top of the chamber (60). The liquid raw material (LM) dropped toward the primary filter (80) is partially vaporized and further converted into a mist by the bubbling action of the carrier gas (CG) blowing from the underside. Since the surface area of the mist is larger than that of the corresponding non-mist material, the liquid raw material (LM) can receive the heat efficiently and the liquid raw material (LM) can be therefore evaporated even at low temperature. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
