| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing an article with a metal film in a desired shape by forming an excellent resist film while suppressing the flow of a liquid-state resist at a ridge where one surface of a base is in contact with the other surface. <P>SOLUTION: The disclosed method includes steps of: forming a continuous metal film all over one surface of a base and the other surface in contact therewith; forming a resist film by applying a liquid-state resist to the metal film by spraying; disposing a photo-lithographic mask on the resist film and performing exposure; bringing the exposed resist film into contact with a developer and patterning it into a desired shape; and forming a metal film in a desired shape by etching the metal film using the patterned resist film, wherein a solvent diluting the liquid-state resist is a solvent with a vapor pressure of 2-butanone or equal therewith or higher. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
