| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a precisely abrasive composition for a hard and brittle material, used for the precise polishing of the hard and brittle material, capable of polishing the surface of the hard and brittle material with high precision, and capable of achieving excellent polishing speed and polishing life. <P>SOLUTION: The precisely abrasive composition for the hard and brittle material is constituted by dispersing or dissolving a colloidal silica having grain size different from that of a base abrasive, and a chelate compound as a polishing promoter in the colloidal silica as the base abrasive. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
