BRUSH WASHING APPARATUS AND BRUSH WASHING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a brush washing apparatus which can wash a semiconductor wafer to a predetermined degree of cleanliness using a sponge brush. SOLUTION: The brush washing apparatus for washing a semiconductor wafer 22 held on a rotary table 11 using a rotationally driven sponge brush 38 comprises: a motor 16 for rotationally driving the rotary table; a motor 34 for rotationally driving a washing brush; a rocking mechanism 32 for rocking the sponge brush in the radial direction of an object to be washed; and a controller 64 for controlling an angle motor so that the relative velocity between an end face of the sponge brush to be brought into contact with the semiconductor wafer and a portion of the semiconductor wafer to be contacted by the end face of the sponge brush is a predetermined value or above, when the sponge brush is rocked outward from the center in the radial direction of the semiconductor wafer. COPYRIGHT: (C)2009,JPO&INPIT