发明名称 |
PLASMA TREATMENT DEVICE/METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To optimize plasma for chemical change and chemical bonding by controlling the condition of plasma. <P>SOLUTION: This plasma treatment device comprises a plasma generation chamber for generating the plasma, a plasma temperature control part for controlling the temperature of the plasma, and a plasma treatment chamber for treating an object to be treated, using the plasma generated at the plasma generation chamber. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009082796(A) |
申请公布日期 |
2009.04.23 |
申请号 |
JP20070253796 |
申请日期 |
2007.09.28 |
申请人 |
TOKYO INSTITUTE OF TECHNOLOGY |
发明人 |
OKINO AKITOSHI;MIYAHARA SHUICHI;GOTO MASARU;NAGATA YOICHI;MEGURO TAICHI;NAKAJIMA HISANORI;KUMAGAI KO |
分类号 |
B01J19/08;C01B13/11;H05H1/24 |
主分类号 |
B01J19/08 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|