发明名称 SPATIAL LIGHT MODULATOR, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DEVICE
摘要 A spatial light modulator has a plurality of mirror elements each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase 180° different from the first phase; and a boundary portion arranged between the mirror elements, which changes the phase of the incident light by a third phase substantially (90°+k·180°) (where k is an integer) different from the first phase. In projecting a pattern with the use of the spatial light modulator, an error caused in the pattern can be reduced even if the light quantity of light passing a gap region between the optical elements in the spatial light modulator is large.
申请公布号 US2016223914(A1) 申请公布日期 2016.08.04
申请号 US201615011145 申请日期 2016.01.29
申请人 Nikon Corporation 发明人 Owa Soichi;Watanabe Yoji;Fujiwara Tomoharu
分类号 G03F7/20;G02B26/06 主分类号 G03F7/20
代理机构 代理人
主权项 1. A spatial light modulator, comprising: a plurality of movable optical elements arranged at a predetermined surface and configured to modulate incident light and emit the modulated light; and a phase changing portion that changes a phase of a first light emitted from a first gap after being incident to the first gap, the first gap being a gap between a first movable optical element and a second movable optical element of the plurality of movable optical elements that is adjacent to the first movable optical element, and a phase of a second light emitted from a second gap after being incident to the second gap, the second gap being a gap between the first movable optical element and a third movable optical element of the plurality of movable optical elements that is adjacent to the first movable optical element.
地址 Tokyo JP