| 摘要 |
PROBLEM TO BE SOLVED: To provide a spattering device for forming thin films having good quality against defects and good in plane uniformity in optical characteristics even for large size substrates and further various kinds of substrate sizes.SOLUTION: The spattering device is used for depositing a thin film for forming a transfer pattern on a translucent substrate, and includes at least one or more deposition chambers, a plurality of spattering cathodes 7 arranged in the deposition chambers, substrate holding means 95 respectively arranged facing the plurality of spattering cathodes 7 for holding the substrates so as to maintain the substrates at fixed positions during the deposition, and spattering gas supply means 9 for supplying a spattering gas to nearby the surfaces of the substrates through gaps between the plurality of spattering cathodes 7. |
