| 摘要 |
PURPOSE:To obtain an ITO sintered compact having a high sintering density and usable as a sputtering target material ensuring excellent sputtering characteristics by mixing a specified tin oxide powder with a specified InO2 powder, compacting and sintering the mixture. CONSTITUTION:Indium oxide powder having 15-30m<2>/g BET surface area, <2 ratio of BET diameter to crystallite diameter, 200-600Angstrom crystallite diameter, 300-700Angstrom BET diameter and <=0.1mum average particle diameter obtd. by measuring particle size distribution or 0.03-0.1mum average particle diameter measured by observation with an electron microscope is wet- or dry-mixed with 3-15wt.% tin oxide powder having 0.3 to several ten mum particle size (average secondary particle diameter) and <3m<2>/g BET surface area. The mixture is compacted by die compacting, casting or other method and the resulting compact is sintered at 1,250-1,600 deg.C for several to several ten hr in the air or in oxygen, inert gas, etc., to obtain the objective sintered compact having >=6.5g/cm<3> density, 1-20mum sintered grain diameter, <=7.0X10<4>OMEGA.cm specific resistance and >=10kg/mm<2> deflective strength by pressureless sintering. |
