发明名称 METHOD OF PRODUCING SEMICONDUCTOR DEVICE
摘要 A method of producing semiconductor components comprises applying a silicon disc (1) with a plurality of successive layers (2, 3, 4) of different types of conductivity to a carrier disc (6) of highly doped silicon through an intermediate layer (5) of aluminium/silicon. The structure is then subdivided (e.g. ultrasonically) to produce individual devices, the silicon carrier disc (6) forming part of the finished device. <IMAGE>
申请公布号 JPS57126142(A) 申请公布日期 1982.08.05
申请号 JP19810200243 申请日期 1981.12.14
申请人 LICENTIA PATENT VERWALTUNGS GMBH 发明人 BUORUFUGANGU BIKORUTSU;KARURUHAINTSU ZONMERU;JIIKUFURIITO SHIYUTOUNPUFU
分类号 H01L21/52;H01L21/28;H01L21/78;H01L23/492 主分类号 H01L21/52
代理机构 代理人
主权项
地址