发明名称 |
METHOD OF PRODUCING SEMICONDUCTOR DEVICE |
摘要 |
A method of producing semiconductor components comprises applying a silicon disc (1) with a plurality of successive layers (2, 3, 4) of different types of conductivity to a carrier disc (6) of highly doped silicon through an intermediate layer (5) of aluminium/silicon. The structure is then subdivided (e.g. ultrasonically) to produce individual devices, the silicon carrier disc (6) forming part of the finished device. <IMAGE> |
申请公布号 |
JPS57126142(A) |
申请公布日期 |
1982.08.05 |
申请号 |
JP19810200243 |
申请日期 |
1981.12.14 |
申请人 |
LICENTIA PATENT VERWALTUNGS GMBH |
发明人 |
BUORUFUGANGU BIKORUTSU;KARURUHAINTSU ZONMERU;JIIKUFURIITO SHIYUTOUNPUFU |
分类号 |
H01L21/52;H01L21/28;H01L21/78;H01L23/492 |
主分类号 |
H01L21/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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