| 摘要 |
PURPOSE:To form the deposition layer on a substrate, by introducing the compound containing carbon and halogen, and the active species made from the film-forming chemical compound which react upon said chemical compound with each other, and making them react chemically by irradiating photo energy. CONSTITUTION:The photoconductive material 10 has the layer structure on the supporting body 11. This layer structure is constituted of the intermediate layer 12 which is installed according to necessity and the photo-sensitive layer 13. The intermediate layer 12 has the function, for example, to prevent effectively the carrier from flowing from the side of supporting body 11 into the photo- sensitive layer 13, and to allow easily the photo-carrier to pass from the side of photo-sensitive layer 13 to the side of supporting body 11. The photo-sensitive layer 13 is formed in the same way as the intermediate layer 12, that is, the compound containing carbon and halogen, the compound containing silicon and halogen which is different from the above one, the active species made from the chemical material for film-forming, and, according to necessity, the inactive gas and the gas of material to introduce impurity, etc. are introduced into the film-forming space, and the photo-sensitive layer 13 is formed on the intermediate layer 12 by applying photo energy. |
