| 摘要 |
An apparatus is disclosed for continuously applying a treating medium onto a moving substrate in a turbulent manner. The apparatus is provided with a chamber through which the substrate and the treating medium are passed. Both the upper and lower portions of the chamber each have at least one cavity which is perpendicular to the direction of travel of the substrate, wherein the respective cavities of the upper and lower portions are coaxial with one another. Each cavity contains an applicator which is capable of turbulently applying the treating medium onto the substrate. A method of treating a substrate with a treating medium using this apparatus is also disclosed. By means of the apparatus and method disclosed, a substrate can be treated in a more controlled and efficient manner.
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