| 摘要 |
PURPOSE:To eliminate the mixture of an impurity in a thin film and to obtain the film having high quality and long and high reliability by depositing the thin film by photoreaction exited by light incident through a light transmissible substrate in the optically pumped thin film deposition. CONSTITUTION:In the optically pumped thin film deposition, light necessary for an optical CVD is passed through the window of a reaction chamber, incident through a light transmissible substrate on which the film is to be deposited, and the film is deposited on the opposite surface of the substrate to the surface on which the light is incident. As the transmissible substrate to be used, a material formed of quartz or synthetic glass having 0.03% or less of trivalent iron ion concentration is preferably employed. As an organic material, a film formed of tetrafluoroethylene, copolymer of other fluorine monomer and ethylene or formed by biaxially orienting the copolymer is preferably employed. |
