| 摘要 |
<p>PURPOSE:To improve X-ray transmittance by providing a mask material holding thin film made of a laminated film which contains a film mainly formed of aluminum nitride and an annular holding substrate for holding the periphery of the thin film. CONSTITUTION:After PIQ solution is spin coated on one side surface of a circular silicon wafer 1, a polyimide film 2 is formed by curing. Then, the wafer 1 formed with the film 2 is set in a plasma CVD unit, an aluminum nitride film 3 is formed on the film 2, epoxy adhesive 5 is coated on one surface of a ring frame 4 of the substrate, and the surface of the film 3 is bonded to the adhesive coating surface. Then, the films 3, 2 are cut along the outer periphery of the frame 4, an ultrasonic wave is acted in surfactant-added aqueous solution to separate and remove the wafer 1, and the film 2 is removed in hydrazine solvent. Thus, the X-ray transmittance of the aluminum film is increased.</p> |
