发明名称 |
ION SOURCE MODULE OF ION INJECTOR |
摘要 |
PURPOSE: An ion source module of ion injector is provided to save a cost required in a manufacture of a semiconductor product by inserting a rear surface slit portion between an arc reaction chamber and a source aperture. CONSTITUTION: An arc reaction chamber(21) in which a reaction is occurred is installed. A gas providing tube(22) provides a gas for forming an ion beam(30) to the arc reaction chamber(21). A filament(23) is installed in an inner portion of the arc reaction chamber(21) and emits a thermal electron. A source electrode(24) is installed to both sides of the arc reaction chamber(21) and provides a voltage. A source aperture(25) is connected to the arc reaction chamber(21) and forms a hole(26) for extracting the ion beam(30) generated in the inner portion of the arc reaction chamber(21). A rear surface slit portion(27) is connected between the arc reaction chamber(21) and the source aperture(25).
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申请公布号 |
KR20000024901(A) |
申请公布日期 |
2000.05.06 |
申请号 |
KR19980041700 |
申请日期 |
1998.10.02 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
YOON, JEONG WOOK |
分类号 |
H01L21/265;(IPC1-7):H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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