| 摘要 |
PURPOSE: A method for manufacturing a field emission display device is provided to improve a stable emission characteristic of a field emission display device by maintaining an emission characteristic of a DNC(Diamond-Like Carbon) thin film. CONSTITUTION: A cathode layer(12) is formed on a lower substrate(11). A gate insulating layer(14) is formed on the cathode layer(12). A gate electrode(15) is formed thereon. The gate electrode(15) and the gate insulating layer(14) are etched. A sacrificial layer(16) is formed on the gate electrode(15). A metal tip(17) with a cone shape is formed by depositing an electron beam on a whole structure. A DLC thin film(20) is formed on an upper portion of the metal tip(17) by depositing DLC into an upper hole. The gate electrode(15) and the metal tip(17) are exposed by removing the DLC(20) of an upper portion of the sacrificial layer(16), a silicon layer(19), and the sacrificial layer(16).
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