| 摘要 |
PURPOSE: A particle eliminator of an etcher for manufacturing a semiconductor is provided to eliminate particles and residual gas generated in an etch process, by cleaning a wafer in a cleaning chamber having a plurality of nozzles for spraying N2 gas before and after the etch process. CONSTITUTION: The wafer(3) is cleaned in the chamber(5). Pincers(13) rotating at a predetermined angle is installed in a side of a robot arm. The robot arm transfers the wafer to the inside of the chamber to change the position of the wafer inside the chamber. A wafer support unit fixedly supports the wafer which is rotated and moved. A spray nozzle(11) sprays cleaning gas to the surface of the wafer fixedly supported by the wafer support unit. An exhaust pipe(21) exhausts the cleaning gas sprayed from the spray nozzle to the exterior of the chamber, installed in the lower portion of the chamber.
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