| 摘要 |
PURPOSE: An exposure apparatus is provided which is improved uniformity of exposure and align degree of a mask, and installation of the mask is easy at a die-set. CONSTITUTION: The exposure apparatus contains i) a frame; ii) a die-set that is installed at the one side of the frame to be opposed with an upper die and a lower die having respectively adsorption unit for each adsorbing by vacuum one-pair mask formed a mark of a fixed pattern; iii) a lift means that the upper die can be lifted and is installed at the one side of the frame; and iv) a mask align CCD of multiplicity that is installed at upside of the die-set perpendicular to the mask to sense align state of the mark of the mask. |
