发明名称 RELEASABLE SUBSTRATE FOR FORMATION OF FILM AND PRODUCTION OF PELLICLE FILM
摘要 <p>PURPOSE:To easily strip pellicle film after the film is formed on a substrate and to obtain a film without scratches or wrinkles by coating the surface of the substrate with an amorphous fluorocarbon resin. CONSTITUTION:The releasble substrate for formation of films is coated with an amorphous fluorocarbon resin. The amorphous fluororesin to be used is, for example, commercially available 'Cytop(R)' and 'Teflon(R)AF'. To treat the substrate with the amorphous fluorocarbon resin, the resin is dissolved to a specified concn., and the obtd. soln. is applied on the surface of a substrate with a spin coater or roll coater. A pellicle film is formed by using this substrate coated with the amorphous fluorocarbon resin, and the formed film is stripped off. Therefore, the obtd. substrate has excellent releasing property so that an org. film formed on this substrate can be easily stripped off and the obtd. pellicle film has no scratch or wrinkle.</p>
申请公布号 JPH06222551(A) 申请公布日期 1994.08.12
申请号 JP19930031345 申请日期 1993.01.27
申请人 SHIN ETSU CHEM CO LTD 发明人 HAMADA YUICHI;NAGATA AKIHIKO;SHIRASAKI SUSUMU;KASHIDA SHU;KUBOTA YOSHIHIRO
分类号 B29C41/12;G03F1/14;H01L21/027;(IPC1-7):G03F1/14 主分类号 B29C41/12
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