发明名称 |
METHOD FOR FORMING CONDUCTIVE FILM PATTERN, ELECTRO- OPTICAL DEVICE AND ELECTRONIC APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a means having the precision of a micron order and forming the conductive film pattern of good quantity with a simple process. SOLUTION: A hydrophilic part and a hydrophobic part are formed into a prescribed pattern on the surface of a substrate by using an organic molecule film. Liquid where conducive fine particles are diffused is selectively applied to the hydrophilic part and it is converted into a conductive film by thermal treatment. Thus, the conductive film is formed only in the hydrophilic part.
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申请公布号 |
JP2002164635(A) |
申请公布日期 |
2002.06.07 |
申请号 |
JP20010197801 |
申请日期 |
2001.06.29 |
申请人 |
SEIKO EPSON CORP |
发明人 |
FURUSAWA MASAHIRO |
分类号 |
C23C24/08;C23C26/00;C23C30/00;H01B13/00;H01L21/288;H01L21/3205;H01L21/768;H01L23/52;H01L29/786;H05K1/03;H05K3/00;H05K3/12;(IPC1-7):H05K3/00;H01L21/320 |
主分类号 |
C23C24/08 |
代理机构 |
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代理人 |
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地址 |
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