发明名称 METHOD FOR FORMING CONDUCTIVE FILM PATTERN, ELECTRO- OPTICAL DEVICE AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a means having the precision of a micron order and forming the conductive film pattern of good quantity with a simple process. SOLUTION: A hydrophilic part and a hydrophobic part are formed into a prescribed pattern on the surface of a substrate by using an organic molecule film. Liquid where conducive fine particles are diffused is selectively applied to the hydrophilic part and it is converted into a conductive film by thermal treatment. Thus, the conductive film is formed only in the hydrophilic part.
申请公布号 JP2002164635(A) 申请公布日期 2002.06.07
申请号 JP20010197801 申请日期 2001.06.29
申请人 SEIKO EPSON CORP 发明人 FURUSAWA MASAHIRO
分类号 C23C24/08;C23C26/00;C23C30/00;H01B13/00;H01L21/288;H01L21/3205;H01L21/768;H01L23/52;H01L29/786;H05K1/03;H05K3/00;H05K3/12;(IPC1-7):H05K3/00;H01L21/320 主分类号 C23C24/08
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