发明名称 Method for manufacturing a semiconductor substrate and method for manufacturing an electro-optical device with electroless plating
摘要 A method is provided including, after joining a wiring substrate and an element substrate, separating a second substrate of the element substrate from a semiconductor element, and electrically coupling an element-side terminal that has been exposed by the separation to a wiring-side terminal disposed outside the semiconductor element by electroless plating.
申请公布号 US7326639(B2) 申请公布日期 2008.02.05
申请号 US20050102903 申请日期 2005.04.08
申请人 SEIKO EPSON CORPORATION 发明人 AKAGAWA SUGURU;YODA TSUYOSHI
分类号 G02F1/1345;H01L21/44;G02F1/1337;G02F1/1368;G09F9/00;G09F9/30;H01L21/02;H01L21/336;H01L21/52;H01L21/60;H01L21/77;H01L21/84;H01L23/48;H01L23/52;H01L23/538;H01L27/12;H01L27/32;H01L29/40;H01L29/786;H01L51/50;H05B33/14 主分类号 G02F1/1345
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