发明名称 |
Contamination control apparatus, management system and related methods |
摘要 |
A contamination control apparatus includes at least two pipes connected by a joint portion and configured to allow a processing fluid to flow therethrough, and a cover configured to enclose the joint portion and to provide an enclosed cavity between the cover and the joint portion. An inlet port is connected to the cover and configured to supply a gas to the cavity. An outlet port is connected to the cover and configured to exhaust the gas and a contaminant from the cavity.
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申请公布号 |
US7357144(B2) |
申请公布日期 |
2008.04.15 |
申请号 |
US20040018837 |
申请日期 |
2004.12.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
IM SUK-HEE;LIM CHANG-SU;PARK SUN-WOOK |
分类号 |
F16L55/00;G01N19/10;B01D46/00;F24F7/06;G01M3/22;G01N1/22;H01L21/02 |
主分类号 |
F16L55/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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