| 摘要 |
PURPOSE:To provide a relief image suitable for formation of a black matrix substrate excellent in light shielding property. CONSTITUTION:This relief image 7 has a black matrix pattern 14 formed on a transparent substrate 13. The relief image 7 essentially consists of a photosensitive resist 6 containing hydrophilic resin and c6ntains 6-14mug/mg metallic compd. which becomes catalytic active by reduction. |
