| 发明名称 |
UNDERLYING ABSORBING OR CONDUCTING LAYER FOR EBEAM DIRECT WRITE (EBDW) LITHOGRAPHY |
| 摘要 |
Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. Particular embodiments are directed to implementation of an underlying absorbing and/or conducting layer for ebeam direct write (EBDW) lithography. |
| 申请公布号 |
WO2016114815(A1) |
申请公布日期 |
2016.07.21 |
| 申请号 |
WO2015US36502 |
申请日期 |
2015.06.18 |
| 申请人 |
INTEL CORPORATION |
发明人 |
TANDON, SHAKUL;BORODOVSKY, YAN A.;WALLACE, CHARLES H.;NYHUS, PAUL A. |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
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