发明名称 PHOTOSENSITIVE RESIN COMOPSITION, PHOTOCURABLE PATTERN FORMED FROM THE SAME AND IMAGE DISPLAY COMPRISING THE PATTERN
摘要 The present invention relates to a photosensitive resin composition, a photocurable pattern formed thereby, and an image display apparatus comprising the same. More specifically, the present invention relates to a photosensitive resin composition comprising a binder resin, a polymeric monomer, a polymerization initiator, a polysiloxane-based first surfactant comprising a repeating unit of a specific structure, a polysiloxane-based second surfactant comprising 5-10 wt% of fluorine in the molecule, and a solvent, thereby being capable of obtaining a curing film which is flat and does not generate dry stains as height difference between a central portion and a front end portion of the film is relatively small when the same is forming, a photocurable pattern formed thereby, and an image display apparatus comprising the same.
申请公布号 KR20160095879(A) 申请公布日期 2016.08.12
申请号 KR20150017392 申请日期 2015.02.04
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHO, YONG HWAN;CHO, BAEK HYUN
分类号 G03F7/075;G03F7/00;G03F7/027;G03F7/032 主分类号 G03F7/075
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