发明名称 ELECTRON BEAM CURRENT, PROFILE AND POSITION MONITOR
摘要 <p>The electron beam monitor includes two long, thin foil elements which are sequentially moved through an electron beam to be measured, in directions transverse to the beam and perpendicular to one another. The electron beam striking the elements produces forward directed bremsstrahlung radiation that is detected by a series of detectors which are positioned circumferentially about the beam path. A measuring circuit measures the radiation intensity as a function of the foil position to provide beam current, profile and position information. To simultaneously monitor a second beam travelling in a direction opposite to the first beam, a second series of detectors are positioned circumferentially about the beam path to detect forward directed radiation produced by the second electron beam as it strikes the foils.</p>
申请公布号 CA1032665(A) 申请公布日期 1978.06.06
申请号 CA19760246958 申请日期 1976.03.02
申请人 MAJESTY (HER) IN RIGHT OF CANADA AS REPRESENTED BY ATOMIC ENERGY O 发明人 HEIGHWAY, EDWARD A.;HOHBAN, KENNETH J.;SCHRIBER, STANLEY O.
分类号 G01T1/29 主分类号 G01T1/29
代理机构 代理人
主权项
地址
您可能感兴趣的专利