发明名称 |
CONFIGURATION DE CONTACT ENFOUI POUR CIRCUITS INTEGRES CMOS/SOS |
摘要 |
A configuration for manufacturing buried contacts in complementary symmetry metal oxide semiconductor (CMOS) manufactured using silicon-on-sapphire (SOS) technology is presented. The buried contact configuration is chosen to provide contact between the epitaxial silicon layer which is grown on the sapphire substrate and the polycrystalline silicon interconnects while insuring that the epitaxial silicon layer will not be removed during the etch which defines the polycrystalline silicon interconnects. |
申请公布号 |
FR2434485(B1) |
申请公布日期 |
1985.07.19 |
申请号 |
FR19790021291 |
申请日期 |
1979.08.23 |
申请人 |
RCA CORP |
发明人 |
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分类号 |
H01L27/08;H01L21/768;H01L21/86;H01L23/482;H01L23/522;H01L27/12;H01L29/78;H01L29/786;(IPC1-7):H01L27/12 |
主分类号 |
H01L27/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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