发明名称 SPUTTERLING TARGET AND PRODUCTION OF SUPERCONDUCTING THIN FILM THEREFROM
摘要 PURPOSE:To provide the title target consisting of Bi, Cu, Ca and oxide(s) containing alkaline earth element(s) [group IIa element(s)] incorporated with each excess of Bi and Ca compared to the composition of the aimed thin film to readily obtain favorable superconducting characteristics. CONSTITUTION:The objective sputterling target consisting at least of Bi, Cu, Ca and oxide(s) of alkaline earth element(s) [group IIa element(s)] incorporated with each excess of Bi and Ca compared to the composition of the aimed thin film. Said target may be used in the form of the powder or granules of a sintered form besides a sintered form itself.
申请公布号 JPH01246143(A) 申请公布日期 1989.10.02
申请号 JP19880072469 申请日期 1988.03.25
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 ICHIKAWA HIROSHI;HIROCHI KUMIKO;ADACHI HIDEAKI;SETSUNE KENTARO;HATTA SHINICHIRO;WASA KIYOTAKA
分类号 H01L39/12;C01G1/00;C01G29/00;C04B35/00;C04B35/45;C04B41/87;C23C14/08;C23C14/34;H01B12/06;H01B13/00;H01L39/24 主分类号 H01L39/12
代理机构 代理人
主权项
地址
您可能感兴趣的专利