发明名称 Process for positioning of a mask relative to another mask or a workpiece and device for executing the process
摘要 <p>A process for positioning, in which a dummy workpiece is not used, in which broadband light can be used as the light source for purposes of alignment, and in which aberration correction is unnecessary, and a device for executing the process is achieved according to the invention by executing projection onto a first mask (M1) by projection lenses (L1,L2) in which at least the workpiece facing sides of the lenses are telecentric. In a state in which a workpiece (W) is absent, actinic light is emitted from a light irradiation part (LH2) onto a second mask (M2). The first mask (or second mask) is moved such that the projected images of the alignment marks (MA2) of the second mask and the alignment marks (MA1) of the first mask come to lie on top of one another. Furthermore, the irradiation light is branched off by beamsplitter (B5) and positions of the alignment marks of the second mask are stored. Next, emission of the actinic light is stopped, a workpiece (W) is inserted into a predetermined position, broadband non-actinic light is emitted from another light irradiation part (LE), positions of the alignment marks (WA1) of the workpiece are determined and the workpiece is moved to bring these alignment marks into position on top of the stored position of the alignment marks of the second mask.</p>
申请公布号 EP0756207(A2) 申请公布日期 1997.01.29
申请号 EP19960112043 申请日期 1996.07.25
申请人 USHIODENKI KABUSHIKI KAISHA 发明人 TANAKA, YONETA;GOTO, MANABU
分类号 G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03F9/00 主分类号 G03F7/20
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