| 摘要 |
A projection optical system for projecting an image of a reticle onto a wafer wherein the first optical element in the projection optical system is a deformable mirror. The deformable mirror deforms into a surface having an aspherical shape. The projection optical system has a reduction ratio in the range of -+E,fra 1/8+EE X to -+E,fra 1/20+EE X.
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