发明名称 METHOD FOR ORDERING PHOTOMASK FOR SEMICONDUCTOR CIRCUITS
摘要 PROBLEM TO BE SOLVED: To provide a method for ordering which does not require the preparation of specifications for each mask in ordering. SOLUTION: The specifications of photomasks 5 used for a plurality of semiconductor circuits which a semiconductor manufacturer manufactures are systematized 20 according to grades, transmitted to a mask maker in a batch and stored in the mask maker's storage device beforehand. At the time of ordering the photomasks, only the mask name and the grade of specifications corresponding to the semiconductor circuit 30 are transmitted via the Internet, and data 2 for plotting and arrangement information data 3 corresponding to the mask name are transmitted via another line.
申请公布号 JP2002328463(A) 申请公布日期 2002.11.15
申请号 JP20010132359 申请日期 2001.04.27
申请人 MITSUBISHI ELECTRIC CORP 发明人 AOYAMA SATORU;KIKUTA HIROKO
分类号 G03F1/50;G03F1/68;G06Q30/06;G06Q50/00;G06Q50/04;H01L21/00;H01L21/027 主分类号 G03F1/50
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