| 摘要 |
PURPOSE: A vapor deposition apparatus is provided to uniformly heat a container and a nozzle by arranging a nozzle heater such that the nozzle heater selectively contacts the top surface of the nozzle. CONSTITUTION: A vapor deposition apparatus comprises a heating container(36) embedded with a deposition source, and a heater(38) arranged at the outer surface of the heating container; a nozzle(37) coupled to an opening(36a) formed on the top surface of the heating container such that the nozzle closes the opening, wherein the nozzle has a nose portion(37a) protruded from the top of the nozzle; a nozzle heater(46) arranged to selectively contact the top surface of the nozzle; an elevating portion(41) arranged to be movable in a vertical direction by an elevating member; and an arm(44) for interconnecting the nozzle heater and the elevating portion, and permitting the nozzle heater to contact the top surface of the nozzle by the elevating motion of the elevating portion.
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