发明名称 |
Exposure apparatus and method for producing device |
摘要 |
There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
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申请公布号 |
US2008030696(A1) |
申请公布日期 |
2008.02.07 |
申请号 |
US20070808231 |
申请日期 |
2007.06.07 |
申请人 |
NIKON CORPORATION |
发明人 |
KOBAYASHI NAOYUKI;TANIMOTO AKIKAZU;MIZUNO YASUSHI;SHIRAISHI KENICHI;NAKANO KATSUSHI;OWA SOICHI |
分类号 |
G03B27/52;G03F7/20 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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