| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus which can deposit a film having a uniform thickness and homogeneous characteristics on a surface to be treated by suppressing change of temperature of sprayed mist by controlling the flow of the sprayed mist. SOLUTION: The film deposition apparatus 1 deposits a film on the surface to be treated of a body 2 to be treated by a spray heat-decomposition method and includes: a supporting means 11 for mounting the body to be treated; a temperature control means 11a for regulating the temperature of the body to be treated; and a discharge means 12a for spraying mist 3 formed from a raw material solution for the film toward the surface to be treated of the body to be treated. The discharge means 12 is arranged at the side or the upper part of the surface to be treated so that a discharge port 12a is located in the vicinity of the outer edge of the surface to be treated, and supplies mist so that the mist sprayed from the discharge port 12a moves along the surface to be treated, temperature-controlled by a heating means. COPYRIGHT: (C)2008,JPO&INPIT
|
