发明名称 積層構造体
摘要 To provide a method for forming a boron-containing thin film, by which a uniform boron thin film with good adhesion can be formed on the surface of a processing object, and also to provide a multilayer structure. An electrolysis apparatus includes an anode 1, a processing object 2 serving as a cathode, an electrolytic vessel 4, and a molten salt electrolytic bath 5. A variable power supply 6 is connected between the anode 1 and the processing object 2. The variable power supply 6 is configured to be capable of changing a voltage or current waveform during the electrolysis process. Current of an appropriate pulse waveform is applied in the molten salt for electrolysis to form a uniform boron thin film 3 within the processing object 2 having a complicated shape.
申请公布号 JP5923478(B2) 申请公布日期 2016.05.24
申请号 JP20130203883 申请日期 2013.09.30
申请人 ローム株式会社;学校法人同志社;アイ’エムセップ株式会社 发明人 鶴見 直明;伊藤 靖彦;徳重 学;里見 剛;錦織 徳二郎;辻村 浩行
分类号 C25D9/08;C25D11/02;H01G4/33 主分类号 C25D9/08
代理机构 代理人
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