| 发明名称 |
SEMICONDUCTOR MANUFACTURING APPARATUS |
| 摘要 |
A semiconductor manufacturing apparatus includes a stage, and an exhaust duct having an annular passage surrounding a processing space over the stage, an annular slit through which a gas supplied to the processing space is led into the annular passage, and an exhaust port through which the gas in the annular passage is discharged to the outside, wherein the opening-area percentage of the slit is increased with increase in distance from the exhaust port. |
| 申请公布号 |
US2016237559(A1) |
申请公布日期 |
2016.08.18 |
| 申请号 |
US201514621167 |
申请日期 |
2015.02.12 |
| 申请人 |
ASM IP Holding B.V. |
发明人 |
TSUJI Naoto |
| 分类号 |
C23C16/44;H01L21/67;C23C16/50;H01J37/32;C23C16/455 |
主分类号 |
C23C16/44 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A semiconductor manufacturing apparatus comprising:
a stage; and an exhaust duct having an annular passage surrounding a processing space over the stage, an annular slit through which a gas supplied to the processing space is led into the annular passage, and an exhaust port through which the gas in the annular passage is discharged to the outside, wherein the opening-area percentage of the slit is increased with increase in distance from the exhaust port. |
| 地址 |
Almere NL |
