发明名称 Verfahren zum Kontaktieren einer Halbleiterzone
摘要 1,181,986. Contacting semi-conductor devices- TELEFUNKEN PATENTVERWERTUNGS G.m.b.H. 19 July, 1967 [30 Aug., 1966], No. 33214/67. Heading H1K. A semi-conductor body 1 of silicon has an epitaxial layer 2 of silicon deposited thereon and is covered with a layer 4 of silicon dioxide or nitride. A P-type region 3 is formed by diffusion and a layer of nickel 6 vapour deposited, followed by a vapour deposited layer 7 of silver. A silver boss 8 is galvanically added. The diode may be mounted between iron-nickel cores joined to copper-sheathed wires and sealed in a glass tube. The silicon body may be of the opposite polarity.
申请公布号 DE1521057(A1) 申请公布日期 1969.08.14
申请号 DE1966T031941 申请日期 1966.08.30
申请人 TELEFUNKEN PATENTVERWERTUNGSGESELLSCHAFT MBH 发明人 BACHMEIER,ALFRED
分类号 H01L21/00;H01L23/051;H01L23/485;H01L23/532 主分类号 H01L21/00
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