| 摘要 |
High resolution metal images, such as diffraction grating, are produced on thin film comprising reflecting, semi-transparent or opaque metallic layer, thin transparent insulating layer and non-grainy transparent light-sensitive layer, with total thickness 50 - 10,000 angstroms, developed with redox system such as silver nitrate and metal developer. Suitable metals for vacuum deposition on glass-, polystyrene-, polyethylene- or similar carrier are rhodium, nickel, aluminium, cadmium, chromium and preferably silver. Preferred materials for insulating layer are silicon dioxide and magnesium fluoride, for light-sensitive layer titanium dioxide and other cpds. of metals with group VI A non-metals. Light-sensitive layer is applied by vapour deposition of cpd., or of metal and subsequent oxidation. Titanium dioxide film may be produced by decomposing titanium tetrachloride with steam. |
