| 摘要 |
<p>Lithographic plate comprises a substrate carrying a radiation sensitive layer which can be exposed to provide discrete areas having different affinities to oil or water. The sensitive layer is deposited onto the substrate from the vapour phase, or in liquid, or powder form and may comprises a chalcogenide or the sulphide, halide or selenide of a metal. Materials used can be sulphides of As, Sb, Cd, Bi, or Cr, halides of Pb Cu or Hg, selenide of As As-S halide cpds. or mixtures of As-S-Sb mixed oxides or oxide mixtures. The deposition of the radiation sensitive layer involves the usual techniques.</p> |
