发明名称 THIN-FILM APPARATUS
摘要 A thin-film apparatus for the treatment of flowable material which is of the type comprising an essentially vertically arranged rotationally symmetrical treatment chamber, the cylindrical wall portion of which possesses an inlet connection for the introduction of the material to be treated. Arranged within the treatment chamber is a substantially coaxial rotor. A distributor ring arrangement is associated with the inlet connection, such distributor ring arrangement being secured concentrically upon the rotor and being recessed or inset in diameter with respect to the treatment chamber wall towards the axis of the rotor. The distributor ring arrangement incorporates a respective ring-shaped or annular disc member at its upper and lower end. Furthermore, an intermediate disc member is secured to the distributor ring arrangement parallel to and at a spacing from the upper disc member, this intermediate disc member approximately coinciding in diameter with the upper disc member. Additionally, a plurality of axially extending vane portions which extend radially up to the treatment chamber wall are provided at the distributor ring arrangement. These vane portions, starting from the lower disc member, and viewed in axial direction, terminating at a distance from the intermediate disc member.
申请公布号 US3633645(A) 申请公布日期 1972.01.11
申请号 USD3633645 申请日期 1970.04.10
申请人 LUWA AG. 发明人 JANOS MIKLOS GORBEI;FRANC DERMOTA
分类号 B01D1/22;(IPC1-7):B01D1/22 主分类号 B01D1/22
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