发明名称 |
METHOD OF AN APPARATUS FOR SPUTTERING |
摘要 |
A sputtering method comprises applying a negative voltage intermittently in a constant periodic cycle to a cathode disposed in a vacuum chamber, wherein the negative voltage is intermittently applied so that a time during which the negative voltage is not applied includes a time during which the voltage is controlled to be zero volt in a range of from 10 .mu.s to 10 ms, and the zero voltage time is equal to or longer than the time required by one arcing from its generation to extinction.
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申请公布号 |
CA2479663(A1) |
申请公布日期 |
1995.01.29 |
申请号 |
CA19942479663 |
申请日期 |
1994.07.27 |
申请人 |
ASAHI GLASS COMPANY LTD. |
发明人 |
WATANABE, SHUJIRO;SHIMIZU, JUNICHI;ANDO, EIICHI;TAKAKI, SATORU;OYAMA, TAKUJI;OSAKI, HISASHI |
分类号 |
C23C14/00;C23C14/54;(IPC1-7):C23C14/54 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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