发明名称 |
Method of shaping the edges of slices of semiconductor material and corresponding apparatus. |
摘要 |
<p>The invention concerns a method in which the edge of the slices (L) is made to slide in contact with the surfaces of a pad (B) soaked in acid substances and in which, during the process, the areas of the edge of the slices that have been in contact with the pad are periodically washed with a special liquid, contained in the tank (M).</p> |
申请公布号 |
EP0297648(A2) |
申请公布日期 |
1989.01.04 |
申请号 |
EP19880201242 |
申请日期 |
1988.06.20 |
申请人 |
SGS-THOMSON MICROELECTRONICS S.P.A. |
发明人 |
BERETTA, GIORGIO;INSERRA, ANTONINO |
分类号 |
H01L21/205;H01L21/00;H01L21/304;H01L21/306 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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