发明名称 |
Depositor for depositing a dielectric layer with fewer metallic impurities and a method for reducing the content of the metallic impurities in the dielectric layer by using this depositor |
摘要 |
The present invention is characterized by setting a filter in the O3-pipe of the depositor used to depositing a dielectric layer, wherein the filter is used to adsorb the metallic impurities in the O3/O2 pipe. Therefore, the content of metallic impurities in the deposited dielectric layer can be efficiently reduced.
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申请公布号 |
US6156122(A) |
申请公布日期 |
2000.12.05 |
申请号 |
US19990393105 |
申请日期 |
1999.09.09 |
申请人 |
WINBOND ELECTRONICS CORP. |
发明人 |
LEE, CHING-LUN |
分类号 |
C23C16/40;C23C16/44;H01L21/316;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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