发明名称 Depositor for depositing a dielectric layer with fewer metallic impurities and a method for reducing the content of the metallic impurities in the dielectric layer by using this depositor
摘要 The present invention is characterized by setting a filter in the O3-pipe of the depositor used to depositing a dielectric layer, wherein the filter is used to adsorb the metallic impurities in the O3/O2 pipe. Therefore, the content of metallic impurities in the deposited dielectric layer can be efficiently reduced.
申请公布号 US6156122(A) 申请公布日期 2000.12.05
申请号 US19990393105 申请日期 1999.09.09
申请人 WINBOND ELECTRONICS CORP. 发明人 LEE, CHING-LUN
分类号 C23C16/40;C23C16/44;H01L21/316;(IPC1-7):C23C16/00 主分类号 C23C16/40
代理机构 代理人
主权项
地址