发明名称 |
METHOD FOR PROVIDING OPTICAL QUALITY SILICON SURFACE |
摘要 |
A system and method for making an optical quality silicon surface on optical systems, including integrated optical waveguide device structures, is provided. A rough surface is formed through a dry etching process. Thermal oxide is grown on the surface either by a wet or dry oxidation process. A HF based solution is used to etch the grown oxide, reducing the surface roughness. The process may be performed repeatedly in order to obtain the desired amount of smoothness. |
申请公布号 |
WO02063355(A2) |
申请公布日期 |
2002.08.15 |
申请号 |
WO2002US02665 |
申请日期 |
2002.02.01 |
申请人 |
INTEL CORPORATION |
发明人 |
NAYDENKOV, MIKHAIL, N.;HUYNH, QUYEN;YEGNANARAYANAN, SIVASUBRAMANIAM |
分类号 |
G02B6/12;G02B6/122 |
主分类号 |
G02B6/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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