| 摘要 |
A method of designing a chemical amplification type photosensitive composition containing an acid generating agent, wherein the average distance between exposure particles in an exposure area of the photosensitive composition upon pattern exposure of the photosensitive composition or the average distance between the acids generated by the pattern exposure is calculated based on the sensitivity required of the photosensitive composition, and the composition of the photosensitive composition is so set that the diffusion length of the acid generated from the acid generating agent by the pattern exposure is greater than the calculated average distance.
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