| 摘要 |
The present invention relates to a positive photosensitive resin composition for use in an LCD manufacturing process, and more particularly, to a composition comprising an alkali-soluble resin and novel quinonediazide sulfonic ester compound that has excellent development properties, leaves little residue, and has good chemical resistance, etc, and is also easily patterned and has high transmissivity, and thus is suitable for forming inter-insulating layers in LCDs and in integrated circuit devices.
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